TEM Gas Plasma Technical Specs Brochure

Perform operando plasma TEM experiments with controlled gas environments, in-situ plasma generation, MEMS heating beyond 1000 °C, and atomic-resolution imaging.

Technical Specs

1300 Series Plasma/Gas

Pressure Range at Sample

Top to bottom plasma

Plasma Geometry

up to 1kV

Plasma Voltage Range

Yes

Holder Gas Inlets/Outlets

1 inlet and 1 outlet on the holder

Gas Controller Configuration

1 experimental gas and 1 inert purge gas

Purge Capability

Yes

Biasing Contacts

4 contacts

EELS / EDS Compatible

Yes

Available For:

www.hummingbirdscientific.com ©Hummingbird Scientific 2026 -The specifications provided are subject to change without notice.

Key Features and Capabilities

Reproducible Screw-Free Plasma-Gas-Cell Assembly

Achieve reproducible plasma-gas-cell assembly with self-aligning windows and a screw-free sealing design

Operando Plasma Generation

Generate stable low-temperature plasma directly adjacent to the specimen for real-time studies of plasma–material interactions

Purgeable 1+1 Channel Gas Delivery System

Control gas pressure from high vacuum to 2 bar using one experimental gas and a dedicated purge line for reliable, repeatable gas-phase and operando plasma TEM experiments

TEM Safety & Seal Verification

Protect your TEM during plasma-gas-cell experiments and streamline setup with rapid high-vacuum seal checking and optical inspection

Optimized for EELS and EDS

Perform correlative spectroscopy and microscopy for detailed in-situ elemental analysis

Integrated Gas Heating

Optional add on

Perform temperature-controlled gas-phase TEM with homogeneous MEMS heating above 1000 °C, 4-point on-chip temperature sensing, and near-drift-free imaging

In-Stock Plasma-Gas-Cell TEM Chip Configurations

Optional add on

Keep experiments moving with in-stock plasma-gas-cell TEM chips designed for operando plasma, gas flow, heating, sample biasing, and multimodal microscopy workflows

www.hummingbirdscientific.com ©Hummingbird Scientific 2026 -The specifications provided are subject to change without notice.

Built for Diverse Applications

High resolution TEM image of catalyst in gaseous environment

Catalysis

Directly observe the mechanisms that drive catalyst activity, selectivity, and degradation.

Heterogeneous Catalysis

Structure-Performance Relationship

Catalyst Structural Transformations

Catalyst Chemical Transformations

Catalyst Redox

Growth of nanocrystals in liquid environments

Synthesis

Uncover nucleation and crystal growth mechanisms, quantify growth kinetics, and optimize synthesis conditions.

Nucleation & Growth

Crystal Growth Kinetics

Morphology Control

Reaction Pathway Analysis

Growth Process Optimization

Atomic resolution image of 2D material flakes

Low Dimensional Materials

Study growth, electrochemistry, and structural evolution in 2D materials, nanowires, and quantum dots.

2D Materials Growth

Ion Intercalation

Defect Evolution

Phase Transformations

Surface Chemistry

Featured Research

Operando plasma TEM imaging of hydrogen-plasma reduction in Fe₃O₄ nanoparticles

a) Operando sequential images of nanoparticles treated by He + 0.5 % H₂ plasma (56 mW). b) EDX-mapped images and corresponding 1-D profiles of net signals of untreated and treated nanoparticles by He + 0.5 % H₂ plasma. c) High-resolution TEM images of untreated and treated nanoparticles by He + 0.5 % H₂ plasma. d) Statistics of integrated net intensity ratios of untreated and treated nanoparticles measured from at least 10 particles foreach case. e) Statistics of particle sizes of untreated and treated nanoparticles. Scale bars denote 50 nm.

Reference: Jae Hyun Nam, et al. Nature Communications (2025). DOI:10.1038/s41467-025-62639-4

www.hummingbirdscientific.com ©Hummingbird Scientific 2026 -The specifications provided are subject to change without notice.

Selected Publications

Jae Hyun Nam, K. Andre Mkhoyan, Daan Hein Alsem, Peter J. Bruggeman. “Revealing the mechanisms of non-thermal plasma-enabled iron oxide reduction through nanoscale operando TEM”. Nature Communications (2025)

DOI:

10.1038/s41467-025-62639-4